Professional Supplier of Nano-Targeted Drug Scientific Research Products

cart
Our Products
  • APIs & Intermediates
  • Biotinylation Reagents
  • Phospholipids
  • Lipid PEGs
  • Functional PEGs
  • Polyester PEGs
  • Polyamino Acids
  • Polymers & Copolymers
  • Gold Nanoparticles
  • Iron Oxide Nanoparticles
  • Silica Particles
  • Quantum Dots
  • Upconverting Nanoparticles
  • Inorganic Nanomaterials
  • Fluorescent Dyes
  • Protein & Enzyme Conjugates
  • Polysaccharides
  • PEG Linkers with Small Molecular
  • Crosslinkers
  • Click Chemistry
  • ADC Linkers
  • MOF Materials
  • Liposomes
  • Hydrogels
  • Microspheres
  • AIE Materials
  • New Release
APIs & Intermediates View More
Biotinylation Reagents View More
Phospholipids View More
Lipid PEGs View More
Functional PEGs View More
Polyester PEGs View More
Polyamino Acids View More
Polymers & Copolymers View More
Gold Nanoparticles View More
Iron Oxide Nanoparticles View More
Silica Particles View More
Quantum Dots View More
Upconverting Nanoparticles View More
Inorganic Nanomaterials View More
Fluorescent Dyes View More
Protein & Enzyme Conjugates View More
Polysaccharides View More
PEG Linkers with Small Molecular View More
Crosslinkers View More
Click Chemistry View More
ADC Linkers View More
MOF Materials View More
Liposomes View More
Hydrogels View More
Microspheres View More
AIE Materials View More
New Release View More
Polymers & Copolymers

Poly(4-vinylbenzoic acid), Mn 16,000-16,500

Catalog: TASK-8-3000803   CAS NO.: N/A
  • 500mg
  • 1g
  • 2g

$68.25$68.25

in stock
Buy Now
Delivery Fill in your shipping address to check the estimated shipping fee of your order

Select Shipping Address

$0.00 delivery Normal Delivery(7Days) Details Cyprum itidem insulam procul a continenti

$0.00 delivery Express Delivery Details Cyprum itidem insulam procul a continenti

  • High Quality Products
  • Fast and Safe Delivery

Description

Poly(4-vinylbenzoic acid) can be used as a resist material in microelectronics and nanofabrication processes, particularly in photolithography. Its high resolution and etch resistance make it suitable for patterning thin films on substrates, which is crucial in the production of semiconductor devices, integrated circuits, and microelectromechanical systems (MEMS).

Specifications

CAS No.N/A
FormulaN/A
Molecular Weight16,000-16,500
Mw/Mn1.1-1.12
Purity98%
Ship Within1 week
Storage Temp.2-8℃
Shipping4-25℃ for up to 3 weeks
Welcome to Taskcm

This email already exists.

Username already exists.

Please confirm the password is the same.

or